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Results: 15
Number of items: 15
  • Open Access
    Haitjema, J., Wu, L., Giuliani, A., Nahon, L., Castellanos, S., & Brouwer, A. M. (2021). UV and VUV-induced fragmentation of tin-oxo cage ions. Physical Chemistry Chemical Physics, 23(37), 20909-20918. https://doi.org/10.1039/d1cp03148a
  • Open Access
    Zhang, Y., Haitjema, J., Castellanos, S., Lugier, O., Sadegh, N., Ovsyannikov, R., Giangrisostomi, E., Johansson, F. O. L., Berggren, E., Lindblad, A., & Brouwer, A. M. (2021). Extreme ultraviolet photoemission of a tin-based photoresist. Applied Physics Letters, 118(17), Article 171903. https://doi.org/10.1063/5.0047269
  • Open Access
    Sadegh, N., van der Geest, M., Haitjema, J., Campi, F., Castellanos, S., Kraus, P. M., & Brouwer, A. M. (2020). XUV induced bleaching of a tin oxo cage photoresist studied by high harmonic absorption spectroscopy. Journal of Photopolymer Science and Technology, 33(2), 145-151. https://doi.org/10.2494/photopolymer.33.145
  • Open Access
    Wu, L., Bespalov, I., Witte, K., Lugier, O., Haitjema, J., Vockenhuber, M., Ekinci, Y., Watts, B., Brouwer, A. M., & Castellanos, S. (2020). Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy. Journal of Materials Chemistry C, 8(42), 14757-14765. https://doi.org/10.1039/d0tc03216f
  • Open Access
    Bespalov, I., Zhang, Y., Haitjema, J., Tromp, R. M., van der Molen, S. J., Brouwer, A. M., Jobst, J., & Castellanos, S. (2020). Key Role of Very Low Energy Electrons in Tin-Based Molecular Resists for Extreme Ultraviolet Nanolithography. ACS Applied Materials and Interfaces, 12(8), 9881-9889. https://doi.org/10.1021/acsami.9b19004
  • Open Access
    Haitjema, J. (2020). Exciting tin-oxo cages: Light-induced chemistry for nanopatterning. [Thesis, fully internal, Universiteit van Amsterdam].
  • Open Access
    Haitjema, J., Wu, L., Giuliani, A., Nahon, L., Castellanos, S., & Brouwer, A. M. (2018). Photo-induced Fragmentation of a Tin-oxo Cage Compound. Journal of Photopolymer Science and Technology, 31(2), 243-247. https://doi.org/10.2494/photopolymer.31.243
  • Open Access
    Zhang, Y., Haitjema, J., Baljozovic, M., Vockenhuber, M., Kazazis, D., Jung, T. A., Ekinci, Y., & Brouwer, A. M. (2018). Dual-tone Application of a Tin-Oxo Cage Photoresist Under E-beam and EUV Exposure. Journal of Photopolymer Science and Technology, 31(2), 249-255. https://doi.org/10.2494/photopolymer.31.249
  • Open Access
    Fallica, R., Haitjema, J., Wu, L., Castellanos Ortega, S., Brouwer, A. M., & Ekinci, Y. (2018). Absorption coefficient of metal-containing photoresists in the extreme ultraviolet. Journal of Micro/Nanolithography, MEMS and MOEMS, 17(2), Article 023505. https://doi.org/10.1117/1.JMM.17.2.023505
  • Haitjema, J., Zhang, Y., Vockenhuber, M., Kazazis, D., Ekinci, Y., & Brouwer, A. M. (2017). Extreme ultraviolet patterning of tin-oxo cages. In E. M. Panning, & K. A. Goldberg (Eds.), Extreme Ultraviolet (EUV) Lithography VIII: 27 February–2 March 2017, San Jose, California, United States Article 1014325 (Proceedings of SPIE; Vol. 10143). SPIE. https://doi.org/10.1117/12.2257911
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