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Results: 10
Number of items: 10
  • Open Access
    Zhang, Y., Haitjema, J., Castellanos, S., Lugier, O., Sadegh, N., Ovsyannikov, R., Giangrisostomi, E., Johansson, F. O. L., Berggren, E., Lindblad, A., & Brouwer, A. M. (2021). Extreme ultraviolet photoemission of a tin-based photoresist. Applied Physics Letters, 118(17), Article 171903. https://doi.org/10.1063/5.0047269
  • Open Access
    Bespalov, I., Zhang, Y., Haitjema, J., Tromp, R. M., van der Molen, S. J., Brouwer, A. M., Jobst, J., & Castellanos, S. (2020). Key Role of Very Low Energy Electrons in Tin-Based Molecular Resists for Extreme Ultraviolet Nanolithography. ACS Applied Materials and Interfaces, 12(8), 9881-9889. https://doi.org/10.1021/acsami.9b19004
  • Open Access
    Zhang, Y. (2019). Organotin photoresists for extreme ultraviolet lithography. [Thesis, fully internal, Universiteit van Amsterdam].
  • Trinh, K. T. L., Zhang, Y., & Lee, N. Y. (2018). One-step DNA purification and amplification on an integrated plastic microdevice for on-site identification of foodborne pathogens. Analytica Chimica Acta, 1040, 63-73. https://doi.org/10.1016/j.aca.2018.06.042
  • Open Access
    Zhang, Y., Haitjema, J., Baljozovic, M., Vockenhuber, M., Kazazis, D., Jung, T. A., Ekinci, Y., & Brouwer, A. M. (2018). Dual-tone Application of a Tin-Oxo Cage Photoresist Under E-beam and EUV Exposure. Journal of Photopolymer Science and Technology, 31(2), 249-255. https://doi.org/10.2494/photopolymer.31.249
  • Haitjema, J., Zhang, Y., Vockenhuber, M., Kazazis, D., Ekinci, Y., & Brouwer, A. M. (2017). Extreme ultraviolet patterning of tin-oxo cages. In E. M. Panning, & K. A. Goldberg (Eds.), Extreme Ultraviolet (EUV) Lithography VIII: 27 February–2 March 2017, San Jose, California, United States Article 1014325 (Proceedings of SPIE; Vol. 10143). SPIE. https://doi.org/10.1117/12.2257911
  • Open Access
    Zhang, Y., Haitjema, J., Liu, X., Johansson, F., Lindblad, A., Castellanos Ortega, S., Ottosson, N., & Brouwer, A. M. (2017). Photochemical conversion of tin-oxo cage compounds studied using hard x-ray photoelectron spectroscopy. In C. K. Hohle (Ed.), Advances in Patterning Materials and Processes XXXIV: 27 February–2 March 2017, San Jose, California, United States Article 1014606 (Proceedings of SPIE; Vol. 10146). SPIE. https://doi.org/10.1117/12.2257893
  • Open Access
    Haitjema, J., Zhang, Y., Vockenhuber, M., Kazazis, D., Ekinci, Y., & Brouwer, A. M. (2017). Extreme ultraviolet patterning of tin-oxo cages. Journal of Micro/Nanolithography, MEMS and MOEMS, 16(3), Article 033510. https://doi.org/10.1117/1.JMM.16.3.033510
  • Open Access
    Zhang, Y., Haitjema, J., Liu, X., Johansson, F., Lindblad, A., Castellanos, S., Ottosson, N., & Brouwer, A. M. (2017). Photochemical conversion of tin-oxo cage compounds studied using hard x-ray photoelectron spectroscopy. Journal of Micro/Nanolithography, MEMS and MOEMS, 16(2), Article 023510. https://doi.org/10.1117/1.JMM.16.2.023510
  • Open Access
    Haitjema, J., Zhang, Y., Ottosson, N., & Brouwer, A. M. (2017). Photoreactions of Tin Oxo Cages, Model EUV Photoresists. Journal of Photopolymer Science and Technology, 30(1), 99-102. https://doi.org/10.2494/photopolymer.30.99
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