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Results: 4
Number of items: 4
  • Open Access
    Thakur, N. (2022). Zinc oxoclusters for extreme ultraviolet lithography. [Thesis, fully internal, Universiteit van Amsterdam].
  • Open Access
    Thakur, N., Vockenhuber, M., Ekinci, Y., Watts, B., Giglia, A., Mahne, N., Nannarone, S., Castellanos, S., & Brouwer, A. M. (2022). Fluorine-Rich Zinc Oxoclusters as Extreme Ultraviolet Photoresists: Chemical Reactions and Lithography Performance. ACS Materials Au, 2(3), 343–355. https://doi.org/10.1021/acsmaterialsau.1c00059
  • Open Access
    Wu, L., Hilbers, M. F., Lugier, O., Thakur, N., Vockenhuber, M., Ekinci, Y., Brouwer, A. M., & Castellanos, S. (2021). Fluorescent Labeling to Investigate Nanopatterning Processes in Extreme Ultraviolet Lithography. ACS Applied Materials and Interfaces, 13(43), 51790-51798. https://doi.org/10.1021/acsami.1c16257
  • Thakur, N., Bliem, R., Mochi, I., Vockenhuber, M., Ekinci, Y., & Castellanos, S. (2020). Mixed-ligand zinc-oxoclusters: Efficient chemistry for high resolution nanolithography. Journal of Materials Chemistry C, 8(41), 14499-14506. https://doi.org/10.1039/d0tc03597a
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