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Results: 9
Number of items: 9
  • Open Access
    Evrard, Q., Sadegh, N., Mathew, S., Zuidinga, E., Watts, B., Paradiz Dominguez, M., Giglia, A., Mahne, N., Nannarone, S., Nishimura, A., Goya, T., Sugioka, T., Vockenhuber, M., Ekinci, Y., & Brouwer, A. M. (2024). Extreme Ultraviolet Photoresponse of Organotin-Based Photoresists with Borate Counteranions. ACS Applied Materials and Interfaces, 16(32), 42947–42956. https://doi.org/10.1021/acsami.4c08636
  • Open Access
    Sadegh, N., Evrard, Q., Kraus, P. M., & Brouwer, A. M. (2024). XUV Absorption Spectroscopy and Photoconversion of a Tin-Oxo Cage Photoresist. Journal of Physical Chemistry C, 128(9), 3965-3974. https://doi.org/10.1021/acs.jpcc.3c07480
  • Open Access
    Sadegh, N., Evrard, Q., Mahne, N., Giglia, A., Nannarone, S., & Brouwer, A. M. (2023). Electron Generation in Tin-oxo Cage Extreme Ultraviolet Photoresists. Journal of Photopolymer Science and Technology, 36(5), 373-378. https://doi.org/10.2494/photopolymer.36.373
  • Open Access
    Evrard, Q., Sadegh, N., Hsu, C. C., Mahne, N., Giglia, A., Nannarone, S., Ekinci, Y., Vockenhuber, M., Nishimura, A., Goya, T., Sugioka, T., & Brouwer, A. M. (2023). Influence of the anion in tin-based EUV photoresists properties. In D. Guerrero, & G. R. Amblard (Eds.), Advances in Patterning Materials and Processes XL: 27 February-1 March 2023, San Jose, California, United States Article 124980Z (Proceedings of SPIE; Vol. 12498). SPIE. https://doi.org/10.1117/12.2658498
  • Open Access
    Sadegh, N. (2023). Spectroscopic investigations of photon-induced reactions in tin-oxo cage photoresists. [Thesis, fully internal, Universiteit van Amsterdam].
  • Open Access
    van der Geest, M. L. S., Sadegh, N., Meerwijk, T. M., Wooning, E. I., Wu, L., Bloem, R., Castellanos Ortega, S., Brouwer, A. M., & Kraus, P. M. (2021). Extreme ultraviolet-excited time-resolved luminescence spectroscopy using an ultrafast table-top high-harmonic generation source. Review of Scientific Instruments, 92(11), Article 113004. https://doi.org/10.1063/5.0064780
  • Open Access
    Zhang, Y., Haitjema, J., Castellanos, S., Lugier, O., Sadegh, N., Ovsyannikov, R., Giangrisostomi, E., Johansson, F. O. L., Berggren, E., Lindblad, A., & Brouwer, A. M. (2021). Extreme ultraviolet photoemission of a tin-based photoresist. Applied Physics Letters, 118(17), Article 171903. https://doi.org/10.1063/5.0047269
  • Lugier, O., Troglia, A., Sadegh, N., van Kessel, L., Bliem, R., Mahne, N., Nannarone, S., & Castellanos, S. (2020). Extreme ultraviolet photoelectron spectroscopy on fluorinated monolayers: Towards nanolithography on monolayers. Journal of Photopolymer Science and Technology, 33(2), 229-234. https://doi.org/10.2494/photopolymer.33.229
  • Open Access
    Sadegh, N., van der Geest, M., Haitjema, J., Campi, F., Castellanos, S., Kraus, P. M., & Brouwer, A. M. (2020). XUV induced bleaching of a tin oxo cage photoresist studied by high harmonic absorption spectroscopy. Journal of Photopolymer Science and Technology, 33(2), 145-151. https://doi.org/10.2494/photopolymer.33.145
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