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Results: 15
Number of items: 15
  • Open Access
    Thakur, N. (2022). Zinc oxoclusters for extreme ultraviolet lithography. [Thesis, fully internal, Universiteit van Amsterdam].
  • Open Access
    van der Geest, M. L. S., Sadegh, N., Meerwijk, T. M., Wooning, E. I., Wu, L., Bloem, R., Castellanos Ortega, S., Brouwer, A. M., & Kraus, P. M. (2021). Extreme ultraviolet-excited time-resolved luminescence spectroscopy using an ultrafast table-top high-harmonic generation source. Review of Scientific Instruments, 92(11), Article 113004. https://doi.org/10.1063/5.0064780
  • Open Access
    Dieleman, C. D. (2021). Patterning colloidal nanocrystals with light and electrons. [Thesis, externally prepared, Universiteit van Amsterdam].
  • Open Access
    Lugier, O. C. M. (2021). Surface-mounted metal-organic frameworks for extreme ultraviolet lithography: Exploration of new nanopatterning processes. [Thesis, externally prepared, Universiteit van Amsterdam].
  • Thakur, N., Bliem, R., Mochi, I., Vockenhuber, M., Ekinci, Y., & Castellanos, S. (2020). Mixed-ligand zinc-oxoclusters: Efficient chemistry for high resolution nanolithography. Journal of Materials Chemistry C, 8(41), 14499-14506. https://doi.org/10.1039/d0tc03597a
  • Lugier, O., Troglia, A., Sadegh, N., van Kessel, L., Bliem, R., Mahne, N., Nannarone, S., & Castellanos, S. (2020). Extreme ultraviolet photoelectron spectroscopy on fluorinated monolayers: Towards nanolithography on monolayers. Journal of Photopolymer Science and Technology, 33(2), 229-234. https://doi.org/10.2494/photopolymer.33.229
  • Open Access
    Sadegh, N., van der Geest, M., Haitjema, J., Campi, F., Castellanos, S., Kraus, P. M., & Brouwer, A. M. (2020). XUV induced bleaching of a tin oxo cage photoresist studied by high harmonic absorption spectroscopy. Journal of Photopolymer Science and Technology, 33(2), 145-151. https://doi.org/10.2494/photopolymer.33.145
  • Open Access
    Haitjema, J. (2020). Exciting tin-oxo cages: Light-induced chemistry for nanopatterning. [Thesis, fully internal, Universiteit van Amsterdam].
  • Open Access
    Wu, L. (2020). Metal oxo clusters: Molecular design for extreme ultraviolet lithography. [Thesis, externally prepared, Universiteit van Amsterdam].
  • Wu, L., Tiekink, M., Giuliani, A., Nahon, L., & Castellanos, S. (2019). Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications. Journal of Materials Chemistry C, 7(1), 33-37. https://doi.org/10.1039/C8TC05273E
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