Passivation Species Suppress Atom-by-Atom Wear of Microcrystalline Diamond

Open Access
Authors
Publication date 01-10-2025
Journal ACS applied materials & interfaces
Volume | Issue number 17 | 39
Pages (from-to) 55511-55520
Number of pages 10
Organisations
  • Faculty of Science (FNWI) - Institute of Physics (IoP)
  • Faculty of Science (FNWI) - Institute of Physics (IoP) - Van der Waals-Zeeman Institute (WZI)
Abstract

Despite its supreme hardness, (synthetic) diamond wears. Due to the small volume loss involved, diamond wear is challenging to quantify, specifically for multicontact interfaces. Consequently, identifying which wear mechanisms dominate the degradation of macroscopically loaded diamond interfaces has remained an open challenge. Using a topography difference method based on atomic force microscopy imaging, we observe the wear of multi-asperity microcrystalline diamond (MCD) surfaces sliding nonrepeatedly against silicon nitride (Si3N4)-coated silicon wafers. By examining the wear scars on Si3N4, which can be seen as footprints of the MCD surface, we are uniquely able to track the nanoscale wear of individual MCD crystallites. Our MCD wear measurements show that the diamond wears atom-by-atom and that this wear is accelerated in the absence of passivation species in the environment. This conclusion is confirmed by ab initio molecular dynamics simulations, highlighting how diamond surface passivation suppresses interfacial bonding. Our results thus demonstrate that atom-by-atom wear occurs even in realistic, multi-asperity diamond contacts and that environmental passivation provides a practical and effective means to control interfacial degradation in advanced tribological systems.

Document type Article
Note With supplimentary file
Language English
Published at https://doi.org/10.1021/acsami.5c08647
Other links https://www.scopus.com/pages/publications/105017737307
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