Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications

Authors
  • L. Wu
  • M. Tiekink
  • A. Giuliani
  • L. Nahon
Publication date 07-01-2019
Journal Journal of Materials Chemistry C
Volume | Issue number 7 | 1
Pages (from-to) 33-37
Number of pages 5
Organisations
  • Faculty of Science (FNWI) - Van 't Hoff Institute for Molecular Sciences (HIMS)
Abstract

The investigation of the photoionization processes of a series of titanium oxo clusters evidenced that doping their organic shell with extended aromatic structures decreases their ionization energy and stabilises the resulting radical cations. Such tunability of their photochemistry arising from ligand exchange gives these hybrid compounds great potential as EUV photoresists.

Document type Article
Note With supplementary file
Language English
Published at https://doi.org/10.1039/C8TC05273E
Other links https://www.scopus.com/pages/publications/85059059200
Permalink to this page
Back