A virtual reactor for simulation of plasma enhanced chemical vapor deposition

Authors	V.V. Krzhizhanovskaya
Supervisors	P.M.A. Sloot
Cosupervisors	Y.E. Gorbachev
Award date	20-06-2008
ISBN	9789090231662
Number of pages	116
Organisations	Faculty of Science (FNWI) - Informatics Institute (IVI)
Document type	PhD thesis
Note	Research conducted at: Universiteit van Amsterdam
Language	English
Published at	http://www.science.uva.nl/research/scs/papers/archive/Krzhizhanovskaya2008a.pdf
Downloads	Thesis Cover Titlepage Contents Chapter 1 Introduction Chapter 2 Modeling and simulation part I : 1D flow and 1D plasma discharge Chapter 3 Modeling and simulation part II : 2D and 3D flow and 1D plasma discharge Chapter 4 Modeling and simulation part III : 3D flow and 2/3D plasma discharge Chapter 5 Parallelization and adaptive load balancing on the grid Chapter 6 Problem solving environment Chapter 7 Summary and conclusions Chapter 8 Nederlandse samenvatting Chapter 9 Acknowledgements Chapter 10 Publications
Permalink to this page

Back

UvA-DARE