Ultrathin, sputter-deposited, amorphous alloy films of ruthenium and molybdenum

Authors
Publication date 15-09-2022
Journal Surface and Coatings Technology
Article number 128729
Volume | Issue number 445
Number of pages 9
Organisations
  • Faculty of Science (FNWI) - Institute of Physics (IoP) - Institute for Theoretical Physics Amsterdam (ITFA)
  • Faculty of Science (FNWI) - Institute of Physics (IoP) - Van der Waals-Zeeman Institute (WZI)
Abstract

Microscopy and diffraction measurements are presented of ultrathin binary alloy films of ruthenium and molybdenum that are obtained by standard sputter deposition. For compositions close to Ru50Mo50, we find the films to be amorphous. The amorphicity of the films is accompanied by a significant reduction of the roughness with respect to the roughness of equally thick films of either ruthenium or molybdenum. We ascribe this to the absence of the grain structure that is characteristic of the polycrystalline films of the separate elements.
Document type Article
Note Funding Information: This work has been carried out at ARCNL – a public-private partnership of the University of Amsterdam (UvA), the VU University Amsterdam, The Dutch Research Council (NWO) and the semiconductor equipment manufacturer ASML – at the University of Groningen and at ASML. Publisher Copyright: © 2022
Language English
Published at https://doi.org/10.1016/j.surfcoat.2022.128729
Other links https://www.scopus.com/pages/publications/85135119413
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