Investigation of optical gain in Eu-doped GaN thin film grown by OMVPE method

Open Access
Authors
Publication date 06-2016
Journal Journal of Science: Advanced Materials and Devices
Volume | Issue number 1 | 2
Pages (from-to) 220-223
Number of pages 4
Organisations
  • Faculty of Science (FNWI) - Institute of Physics (IoP) - Van der Waals-Zeeman Institute (WZI)
  • Faculty of Science (FNWI)
  • Faculty of Science (FNWI) - Institute of Physics (IoP) - Institute for High Energy Physics (IHEF)
  • Faculty of Science (FNWI) - Institute of Physics (IoP)
Abstract
We prepare and optically characterize a thin film of GaN:Eu. Room temperature intense emission band at around 620 nm is observed, corresponding to 5D0 → 7F2 electronic dipole transition of Eu3+ ions in the GaN host material. At lower temperatures, three components, at 621, 622, and 623 nm, arising from different Eu3+ optical centers, can be distinguished. Using a combination of variable stripe length (VSL) and shifting excitation spot (SES) methods we investigate optical gain of this Eu-related PL band at room temperature and determine its lower limit to be approximately 14 cm−1.
Document type Article
Note In: Special Issue in Memory of Dr. P.E. Brommer
Language English
Published at https://doi.org/10.1016/j.jsamd.2016.06.004
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Investigation of optical gain in Eu (Final published version)
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