In situ spectroscopy of intrinsic Bi2Te3 topological insulator thin films and impact of extrinsic defects

Open Access
Authors
  • P. Ngabonziza
  • R. Heimbuch
  • N. de Jong
  • R.A. Klaassen
Publication date 2015
Journal Physical Review B
Article number 035405
Volume | Issue number 92 | 3
Number of pages 7
Organisations
  • Faculty of Science (FNWI) - Institute of Physics (IoP) - Van der Waals-Zeeman Institute (WZI)
Abstract
Combined in situ x-ray photoemission spectroscopy, scanning tunneling spectroscopy, and angle resolved photoemission spectroscopy of molecular beam epitaxy grown Bi2Te3 on lattice mismatched substrates reveal high quality stoichiometric thin films with topological surface states without a contribution from the bulk bands at the Fermi energy. The absence of bulk states at the Fermi energy is achieved without counterdoping. We observe that the surface morphology and electronic band structure of Bi2Te3 are not affected by in vacuo storage and exposure to oxygen, whereas major changes are observed when exposed to ambient conditions. These films help define a pathway towards intrinsic topological devices.
Document type Article
Note With supplemental material
Language English
Published at https://doi.org/10.1103/PhysRevB.92.035405
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In situ spectroscopy (Final published version)
Supplementary materials
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